Our scientists are authors of several patents, which are mentioned below:
1. Wasiak A., Zawadzki Z. X-ray diffraction camera for small-angle diffraction studies. Polish Patent P-172561 (1977)
2. Wasiak A., Sajkiewicz P., Zawadzki Z.The device for studies of the structural changes in polymers under stress. Polish Patent P-161567 (1994)
3. Zawadzki Z., Wasiak A., Sajkiewicz P. The device for controlled stretching of polymer samples under microscope. Polish Patent P182309, WUP 12/2001 2001-12-31.
4. Meier D.J., Jarecki L. Ultra-drawing crystalline polymers under high pressure. US Patent 4348350 (1982)
5. Meier D.J., Jarecki L. Process for extreme drawing of crystalline polymers under high pressure. DE3229472 (1984)
6. Dulnik J., Denis P., Sajkiewicz P., Sposób otrzymywania szerokoporowatego, poliestrowego rusztowania komórkowego, Patent Application, P.414353, 2015-10-13
7. Kowalewski T.A., Lamparska D., Zembrzycki K., Kowalczyk T.,Sposób wytwarzania mat z nanowłókien. PL 222733, WUP 08/16 2016-08-31